Topics Overview

Committees

Americas:
Kent Choquette (area chair), University of Illinois at Urbana-Champaign, USA
Joe Abeles, Sarnoff Corporation, USA
John Bowers, University of California Santa Barbara, USA
Connie Chang-Hasnain, University of California Berkeley, USA
Greg Charache, Trumpf Inc., USA
Weng Chow, Sandia National Labs, USA
Mario Dagenais, University of Maryland, USA
Douglas Hall, University of Notre Dame, USA
Paul Leisher, nLight Corporation, USA
Benjamin Williams, University of California, Los Angeles, USA

Europe/CIS/Africa/Middle East:
Peter Smowton (area chair), Cardiff University UK
Jørn Hvam, Technical University of Denmark, Denmark
Cristina Masoller, Universidad Politecnica de Cataluña, Spain
Marina Meliga, Avago Technologies, Italy
Eoin O’Reilly, Tyndall National Institute, Ireland
Krassimir Panajotov, Vrije Universiteit Brussel, Belgium
Richard Penty, Cambridge University, United Kingdom
Hans-Peter Reithmaier, Institute of Nano –structure Technologies and Analytics, Germany
Carlo Sirtori, Université Paris Diderot-Paris7, France
Peter Vasilev, PN Lebedev Physical Institute, Russia
Dan Yanson, SCD Semiconductor Devices, Israel

Asia/Australia:
Yuichi Tohmori (area chair), NTT Electronics Corp., Japan
Toshitaka Aoyagi, Mitsubishi Electric Corp., Japan
Chennupati Jagadish, Australian National University, Australia
Tomoaki Kato, NEC, Japan
Yong-Hee Lee, KAIST, Korea
Yi Luo, Tsinghua University, China
Tomoyuki Miyamoto, Tokyo Institute of Technology, Japan
Kouji Nakahara, Hitachi Ltd., Japan
Yoshiaki Nakano, University of Tokyo, Japan
Shing C. Wang, National Chiao Tung University, Taiwan
Atsushi Yamaguchi, Kanazawa Institute of Technology, Japan
Tsuyoshi Yamamoto, Fujitsu Laboratories Ltd., Japan

Organizing Committee:
Shinji Tsuji (chair) , Hitachi, Ltd., Japan
Koichi Akahane, NICT, Japan
Toshihiko Baba, Yokohama National University, Japan
Kiichi Hamamoto, Kyushu University, Japan
Shoji Hirata, Sony Corporation, Japan
Masahiro Ishida, Panasonic Corporation, Japan
Akihiko Kasukawa, Furukawa Electric Co., Ltd., Japan
Tsukuru Katsuyama, Sumitomo Electric Industries, Ltd., Japan
Yoichi Kawakami, Kyoto University, Japan
Ken Morito, Fujitsu Laboratories Ltd., Japan
Takashi Mukai, Nichia Corporation, Japan
Ken Nakahara, ROHM Co., Ltd., Japan
Susumu Noda, Kyoto University, Japan
Hiromi Ohashi, NTT Corporation, Japan
Shunichi Sato, Ricoh Company, Ltd., Japan
Mitsusato Shimizu, AIST, Japan
Kazunori Shinoda, Hitachi, Ltd., Japan
Ikuo Suemune, Hokkaido University, Japan
Toshiaki Suhara, Osaka University, Japan
Masaki Tohyama, Toshiba Corporation, Japan
Mamoru Uchida, Canon Inc., Japan
Nobuaki Ueki, Fuji Xerox Co., Ltd., Japan
Kazuhisa Uomi, Opnext Japan Inc., Japan
Katuyuki Utaka, Waseda University, Japan
Tsutomu Watanabe, Fujikura Ltd., Japan
Tetsuya Yagi, Mitsubishi Electric Corporation, Japan
Hiroshi Yasaka, Tohoku Univerisity, Japan